Koji Yamada1, Shuhei Nishimura1, Tsuyoshi Nakamura1, Lifeng He2 and Hidenori Itoh1
1Nagoya Institute of Technology, Gokiso-cho, Showa-ku, Nagoya 466-8555, Japan
2Aichi Prefectural University, Nagakute-cho, Aichi-gun, Aichi, 480-1198, Japan
(Received June 15, 2001; Accepted January 30, 2002)
Keywords: Scratched Look, Blurred Look, Font Boldness Function, Character Structure, Ink Amount Function
Abstract. In this paper, we describe how to enhance the quality of brush-style-font expression, which are scratched look and blurred look, with regard to a form as a pattern of a Chinese character. The previous version of the system uses only a parameter similar to pen pressure, however actual calligraphic art requires more various factors in order to realize the expression. Our novel approach considers character structure, brush-drawing order and ink amount, and attempts to acquire effective brush-style expression.