Forma, Vol. 9 (No. 3), pp. 209-215, 1994

Wallpaper Design—An Application of Residue Patterns

Munekazu Sakamoto and Mikio Takagi

Institute of Industrial Science, University of Tokyo, 7-22-1, Roppongi, Minato-ku, Tokyo 106, Japan

(Received January 31, 1994; Accepted July 12, 1994)

Keywords: Smoothing Contour, Selective Filling, One-to-Many Color Assignment

Abstract. This paper proposes a new technique for computer aided artistic design based on residue patterns. The problems of the jagginess of digital images and scattered points due to the residue pattern were resolved by means of smoothing contour and selective filling respectively. The proposed technique can create patterns with more natural and noise-free motifs. A color pattern is made of four overlaid black-and-white patterns by assigning color values to all the combinations of black and white of the components in one-to-many correspondence. The assignment amalgamates several latent color areas into a new form.